Extreme Ultraviolet Lithography

Silicon has been the heart of the world’s technology boom for nearly half a century. Each year, manufacturers bring out the next great computer chip that boosts computing power and allows our Personal Computers to do more than we imagined just a decade ago. The current technology used to make microprocessors, deep ultraviolet lithography will begin to reach its limit around 2005. At that time, chipmakers will have to look to other technologies to cram more transistors onto silicon to create powerful chips. Many are already looking at extreme-ultraviolet lithography (EUVL) as a way to extend the life of silicon at least until the end of the decade.

Akin to photography, lithography is used to print circuits onto microchips Extreme Ultraviolet Lithography (EUVL) will open a new chapter in semiconductor technology. In the race to provide the Next Generation Lithography (NGL) for faster, more efficient computer chips, EUV Lithography is the clear frontrunner. Here we discusses the basic concepts and current state of development of EUV lithography (EUVL), a relatively new form of lithography that uses extreme ultraviolet (EUV) radiation with a wavelength in the range of 10 to 14 nanometers (nm) to carry out projection imaging. EUVL is one technology vying to become the successor to optical lithography.

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